Electron spectroscopies workshop

The workshop will cover several electron spectroscopy methods available in the LSM XPS facilities. X-ray photoemission spectroscopy (XPS) is a powerful technique allowing elemental and chemical analysis of surfaces. Coupled to sputtering, XPS can measure elemental depth profiles across materials. For non-destructive depth profiles, angle-resolved x-ray photoemission spectroscopy (ARXPS) is an alternative method to probe near-surface elemental and chemical information. UV-photoemission can be used to probe valence states with great details and can provide a measure of surface work functions. Reflected electron energy loss spectroscopy (REELS) is a complementary technique that can access energy band gaps. Thus, a combination UPS and REELS provides a picture of band edges and vacuum energy levels. Secondary electron yields (SEY) measurements, a recent addition to our capabilities, will be discussed as well. All these techniques will be illustrated with recent applications ranging from LED technologies, to photocatalysis, photolithography or organic electronics.

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